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DUPONT AIR PRODUCTS NANOMATERIALS UNVEILS
NEW COLLOIDAL SILICA SLURRY FOR ENHANCED CHEMICAL MECHANICAL
PLANARIZATION
CARLSBAD, Calif. (April 16, 2002) - Today at SEMICON®
Europa, DuPont Air Products NanoMaterials L.L.C. ("DA
NanoMaterials"), a 50/50 joint venture company of DuPont
(NYSE:DD) and Air Products and Chemicals, Inc. (NYSE:APD),
unveiled an ammonia-stabilized colloidal silica slurry for
enhanced chemical mechanical planarization (CMP) processes.
CMP involves the mechanical grinding and chemical etching
of various dielectric and metal layers in the manufacture
of an integrated circuit.
Slurries are comprised of very fine silica particles dispersed
in water along with chemicals. They are used to polish surfaces
of electronic substrates and devices to smooth finishes.
DA NanoMaterials' newest slurry offering will be marketed
under the Ascend® OX-200 trademark, joining other slurries
the joint venture markets under its Syton® and Mazin®
trademarks.
Ascend OX-200 slurry has an average particle size of 40
nanometers. It contains low levels of metals and sodium
and is recommended for CMP applications which may be sensitive
to these impurities. In comparative analyses of Ascend OX-200
and a competitive colloidal slurry on both one-platen and
multi-platen tools, Ascend OX-200 was proven to provide
better removal rates and lower defective rates.
DA NanoMaterials will manufacture the slurry blend at its
world-class facility in Ruabon, Wales to supply the global
slurry market - an estimated $500 million annual market
that is growing at a rate of 20-25 percent per year.
"Ascend OX-200 slurry has proven performance utilizing
various tool parameters that allow the process to be dialed
into specific performance requirements," noted Michael
C. Springman, vice president, Sales and Marketing for DA
NanoMaterials. "It is another important addition to
our growing product line as we look to provide better slurry
and services and respond to our customers' needs even faster."
Mr. Springman noted that the slurry has already been tested
and proven both in the company's laboratories and at numerous
customer sites. The development and commercialization of
Ascend OX-200 initially sprang from market demand for a
versatile slurry that could be used in both STI and interlayer
dielectric polishing applications.
Headquartered in Carlsbad, Calif., DuPont Air Products
NanoMaterials L.L.C. (www.nanoslurry.com) combines the expertise
of DuPont in developing and manufacturing colloidal silica
sols and particles for electronic applications with Air
Products' manufacturing and technical leadership, on-site
management capabilities, sales and marketing infrastructure
and logistics expertise in providing the broad range of
electronic gases and chemicals that surround a process tool.
The company operates a manufacturing and formulation facility
in Ruabon, U.K.; a state-of- the-art applications and formulation
laboratory in Tempe, Arizona; a silica lab at Research Triangle
Park, North Carolina; and a formulation laboratory at Utsunomyia,
Japan.
***NOTE: Forward-Looking
Statements:
This news release contains forward-looking statements based
on management's current expectations, estimates and projections.
All statements that address expectations or projections
about the future, including statements about the joint venture
company's strategy for growth, product development, market
position, expected expenditures and financial results are
forward-looking statements. Some of the forward-looking
statements may be identified by words like "expects,"
"anticipates," "plans," "intends,"
"projects," "indicates," and similar
expressions. These statements are not guarantees of future
performance and involve a number of risks, uncertainties
and assumptions. Many factors, including those discussed
more fully elsewhere in this release and in DuPont and Air
Products' filings with the Securities and Exchange Commission,
particularly their latest annual reports on Form 10-K, as
well as others, could cause results to differ materially
from those stated. These factors include, but are not limited
to changes in the laws, regulations, policies and economic
conditions of countries in which the companies do business;
competitive pressures; successful integration of structural
changes, including acquisitions, divestitures and alliances;
and research and development of new products, including
regulatory approval and market acceptance.
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